NF3
NF3 is a colorless, stable, and toxic gas, which has been a chamber--cleaning gas in chemical-vapour deposition semiconductor production process and in LCD production. Application also includes etching of polysilicon, Silicon Nitride, Tungsten Silicate and Tungsten films. NF3 can also be used as laser gas.
QUALITY STANDARD FOR NF3
QUALITY STANDARD FOR NF3
|
ITEM |
Company standard | ||||
|
NF3, 10-2 (v/v) ≥ |
99.5 |
99.9 |
99.98 |
99.99 |
99.996 |
|
CF4, 10-6 (v/v) ≤ |
1500 |
500 |
100 |
50 |
20 |
|
N2, 10-6 (v/v) ≤ |
700 |
50 |
10 |
10 |
5 |
|
O2+Ar, 10-6 (v/v)≤ |
700 |
50 |
10 |
5 |
3 |
|
CO, 10-6 (v/v) ≤ |
50 |
10 |
10 |
5 |
1 |
|
CO2, 10-6 (v/v) ≤ |
25 |
10 |
10 |
5 |
0.5 |
|
N2O, 10-6 (v/v) ≤ |
50 |
10 |
10 |
5 |
1 |
|
SF6, 10-6 (v/v) ≤ |
50 |
50 |
10 |
5 |
2 |
|
Hydralysable fluorides(expressed as HF), 10-6 (v/v) ≤ |
1 |
1 |
1 |
1 |
1 |
|
H2O, 10-6 (v/v) ≤ |
1 |
1 |
1 |
1 |
1 |